Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films

Hiroyasu Kondo; Kazuaki Inohara; Yuki Taniguchi; Junko Nakahata; Tetsuya Homma; Hideo Takahashi

doi:10.1007/s10043-001-0323-y

Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films

Hiroyasu Kondo, Kazuaki Inohara, Yuki Taniguchi, Junko Nakahata, Tetsuya Homma, Hideo Takahashi

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H₂SiF₆) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were -4.0 × 10^-6/°C, -60 × 10^-6/°C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V.

Original language	English
Pages (from-to)	323-325
Number of pages	3
Journal	Optical Review
Volume	8
Issue number	5
DOIs	https://doi.org/10.1007/s10043-001-0323-y
Publication status	Published - 2001 Jan 1

Keywords

Fluorinated silicon oxide
Optical switch
Spin-on-glass
Thermo-optic effect
Thin-film optical waveguide

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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10.1007/s10043-001-0323-y

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title = "Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films",

abstract = "A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were -4.0 × 10-6/°C, -60 × 10-6/°C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V.",

keywords = "Fluorinated silicon oxide, Optical switch, Spin-on-glass, Thermo-optic effect, Thin-film optical waveguide",

author = "Hiroyasu Kondo and Kazuaki Inohara and Yuki Taniguchi and Junko Nakahata and Tetsuya Homma and Hideo Takahashi",

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doi = "10.1007/s10043-001-0323-y",

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T1 - Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films

AU - Kondo, Hiroyasu

AU - Inohara, Kazuaki

AU - Taniguchi, Yuki

AU - Nakahata, Junko

AU - Homma, Tetsuya

AU - Takahashi, Hideo

PY - 2001/1/1

Y1 - 2001/1/1

N2 - A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were -4.0 × 10-6/°C, -60 × 10-6/°C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V.

AB - A thermo-optic switch in a thin-film optical waveguide was investigated. Fluorinated silicon oxide (SiOF) and organic spin-on-glass (SOG) films were used as core-layer and clad-layer, respectively, in the waveguide structure. The SiOF films were formed at 23°C by a liquid-phase deposition (LPD) technique using a supersaturated hydrofluosilicic acid (H2SiF6) aqueous solution. Thermal coefficients of the refractive indices for LPD-SiOF and organic SOG films formed on silicon (Si) substrates were -4.0 × 10-6/°C, -60 × 10-6/°C at the wavelength of 632.8 nm, respectively. A high extinction ratio of 15 dB was obtained for this switch at the applied voltage of 12.8 V.

KW - Fluorinated silicon oxide

KW - Optical switch

KW - Spin-on-glass

KW - Thermo-optic effect

KW - Thin-film optical waveguide

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EP - 325

JO - Optical Review

JF - Optical Review

IS - 5

ER -

Thermo-optic switch using fluorinated silicon oxide and organic spin-on-glass films

Abstract

Keywords

ASJC Scopus subject areas

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