Thickness-dependent optical properties of ZnO thin films

L. Miao, S. Tanemura, M. Tanemura, S. P. Lau, B. K. Tay

Research output: Contribution to journalArticlepeer-review

26 Citations (Scopus)


Spectroscopic ellipsometry was employed to study the thickness dependence of the optical properties of ZnO thin films. ZnO thin films with a nominal thickness of 100, 200, and 400 nm were deposited by filtered cathodic vacuum arc (FCVA) method. The optical band gap showed a slight blue shift with respect to the bulk value with increasingly thicker ZnO films deposited on Si, while no shift with thickness could be observed for ZnO films deposited on a SiO 2/Si substrate, indicating a possible effect of the SiO 2 buffer layer on the film optical properties. The Urbach tail parameter E 0 increased as the film thickness is increased, indicating a decrease in the structural disorder with increasing film thickness.

Original languageEnglish
Pages (from-to)343-346
Number of pages4
JournalJournal of Materials Science: Materials in Electronics
Issue numberSUPPL. 1
Publication statusPublished - 2007 Oct
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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