Tribological properties of physical vapor deposited ZrN thin films

Atsushi Mitsuo, Tatsuhiko Aizawa

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Zirconium nitride thin films were prepared by ion-beam assisted deposition (IBAD) on silicon substrates. The films were synthesized by depositing zirconium vapor simultaneous irradiation with nitrogen ions. Transport ratio of Zr to N was varied between 1.0 and 3.0, and N-ion beam energy was kept 0.5 and 1.0 keV. The films were characterized by X-ray diffraction and X-ray photoelectron spectroscopy. Hardness of the films was investigated with a nano-indentation tester. The films were tested for friction and wear on a ball-and-disk tribometer, under 5 N load and 10 mm/s relative sliding speed with steel balls as the counter material. The hardness of the films increased with decreasing the transport ratio. Tribological properties of films were compared with post chlorine-ion implanted films.

Original languageEnglish
Title of host publicationInternational Surface Engineering Congress - Proceedings of the 1st Congress
Pages127-130
Number of pages4
Publication statusPublished - 2003 Dec 1
EventInternational Surface Engineering Congress - Proceedings of the 1st Congress - Colombus, OH, United States
Duration: 2002 Oct 72002 Oct 10

Publication series

NameInternational Surface Engineering Congress - Proceedings of the 1st Congress

Conference

ConferenceInternational Surface Engineering Congress - Proceedings of the 1st Congress
Country/TerritoryUnited States
CityColombus, OH
Period02/10/702/10/10

Keywords

  • Chlorine ion implantation
  • Friction coefficient
  • Hardness
  • Ion beam assisted deposition
  • Zirconium nitride

ASJC Scopus subject areas

  • Engineering(all)

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