西川 宏之

研究成果

年別の研究成果 1989 1994 1995 1996 1997 2007 2009 2010 2011 2012 2022

• 139 Article
• 17 Conference contribution
• 9 Conference article
• 8 Paper
• 1 その他
  • 1 Review article

年別の研究成果

年別の研究成果

検索結果

• 2005

  Dependence of the luminescence properties of submicron silica particles on manufacturing conditions

  Harao, A., Inai, S., Sato, H. & Nishikawa, H., 2005 10月 7, p. 672-675. 4 p.

  研究成果: Paper › 査読

  • Photoluminescence 100%
  • Luminescence 90%
  • Silica 63%
  • Annealing 61%
  • Luminiscence Type 43%
  1 被引用数 (Scopus)

• Effects of thermal anneal on the UV photosensitivity for writing of Bragg gratings on Ge-doped silica thin films by a plasma CVD method

  Hattori, T., Irisawa, E. & Nishikawa, H., 2005, p. 636-639. 4 p.

  研究成果: Paper › 査読

  • Plasma CVD 100%
  • Photosensitivity 89%
  • Bragg gratings 83%
  • Plasma Chemical Vapour Deposition 74%
  • Absorption spectra 60%

• Irradiation effects on silica glass by ion microbeam for fabrication of optical elements

  Murai, M., Fukagawa, K., Nishikawa, H., Nakamura, T., Ohki, Y., Oikawa, M., Sato, T. & Arakawa, K., 2005, p. 210-213. 4 p.

  研究成果: Paper › 査読

  • Fused silica 100%
  • Refractive index 93%
  • Optical devices 92%
  • Irradiation 73%
  • Refractive Index 69%
• 2003

  Absorption changes induced by UV-photon irradiation in Ge-doped SiO₂ thin films fabricated by plasma CVD method from tetraethoxysilane

  Yanagi, T., Ohki, Y. & Nishikawa, H., 2003 10月 20, p. 1088-1091. 4 p.

  研究成果: Paper › 査読

  • Plasma CVD 100%
  • Light absorption 83%
  • Plasma Chemical Vapour Deposition 74%
  • Photons 65%
  • Photosensitivity 59%

• Optical properties of self-assembled silica particles

  Tatara, Y., Sato, H. & Nishikawa, H., 2003 10月 20, p. 41-44. 4 p.

  研究成果: Paper › 査読

  • Optical properties 100%
  • Silica 82%
  • Dihedral Angle 67%
  • Hydroxyl 67%
  • Annealing 63%
  2 被引用数 (Scopus)
• 1998

  Photoluminescence and electron-spin-resonance studies of defects in amorphous SiO₂ films

  Nishikawa, H., Fukui, H., Watanabe, E., Ito, D., Seol, K. S. & Ohki, Y., 1998 12月 1, p. 59-62. 4 p.

  研究成果: Paper › 査読

  • Photoluminescence 100%
  • Plasma enhanced chemical vapor deposition 87%
  • Paramagnetic resonance 83%
  • Plasma Enhanced Chemical Vapour Deposition 74%
  • Oxygen 49%
• 1995

  Luminescence properties of defects in P⁺- or B⁺-implanted thermally grown silicon dioxide

  Seol, K. S., Ieki, A., Ohki, Y., Nishikawa, H. & Takiyama, M., 1995 12月 1, p. 85-88. 4 p.

  研究成果: Paper › 査読

  • Photoluminescence 100%
  • Luminescence 90%
  • Silica 63%
  • Defects 42%
  • Excimer lasers 31%
  1 被引用数 (Scopus)
• 1989

  325-nm absorption band by peroxy linkage in pure silica core fiber

  Nishikawa, H., Tohmon, R., Ohki, Y., Hama, Y. & Nagasawa, K., 1989 12月 1, p. 158-159. 2 p.

  研究成果: Paper › 査読

  • Absorption spectra 100%
  • Silica 70%
  • Oxygen 55%
  • Fibers 46%
  • Light absorption 34%
  3 被引用数 (Scopus)