A 7-Mask CMOS Process with Selective Oxide Deposition

T.Horiuchi T.Horiuchi, K.Kanba K.Kanba, T.Homma T.Homma, Y.Murao Y.Murao, K.Okumura K.Okumura, Tetsuya Homma

研究成果: Article › 査読

本文言語	English
ページ（範囲）	1455-1460
ジャーナル	IEEE Transaction on Electron Devices
巻	40
出版ステータス	Published - 1993 8月 1

引用スタイル

@article{acba575c152d4a08a6a8b7dd01d2dee1,

title = "A 7-Mask CMOS Process with Selective Oxide Deposition",

author = "T.Horiuchi T.Horiuchi and K.Kanba K.Kanba and T.Homma T.Homma and Y.Murao Y.Murao and K.Okumura K.Okumura and Tetsuya Homma",

year = "1993",

month = aug,

day = "1",

language = "English",

volume = "40",

pages = "1455--1460",

journal = "IEEE Transaction on Electron Devices",

}