A New Characterization Technique for Depth-Dependent Dielectric Properties of High-k Films by Open-Circuit Potential Measurement

K. Kita, M. Sasagawa, K. Kyuno, A. Torium

研究成果: Article › 査読

本文言語	English
ページ（範囲）	166-170
ジャーナル	2003 Int. Conference on Characterization and Metrology for ULSI Technology； AIP Conf. Proceedings 550
出版ステータス	Published - 2003 3月 1

引用スタイル

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title = "A New Characterization Technique for Depth-Dependent Dielectric Properties of High-k Films by Open-Circuit Potential Measurement",

author = "K. Kita and M. Sasagawa and K. Kyuno and A. Torium",

year = "2003",

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language = "English",

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journal = "2003 Int. Conference on Characterization and Metrology for ULSI Technology； AIP Conf. Proceedings 550",

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T1 - A New Characterization Technique for Depth-Dependent Dielectric Properties of High-k Films by Open-Circuit Potential Measurement

AU - Kita, K.

AU - Sasagawa, M.

AU - Kyuno, K.

AU - Torium, A.

PY - 2003/3/1

Y1 - 2003/3/1

M3 - Article

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EP - 170

JO - 2003 Int. Conference on Characterization and Metrology for ULSI Technology； AIP Conf. Proceedings 550

JF - 2003 Int. Conference on Characterization and Metrology for ULSI Technology； AIP Conf. Proceedings 550

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