A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

Naoki Ono; Kazuhiro Harada; Jun Furukawa; Kazuya Suzuki; Michio Kida; Yasushi Shimanuki

A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

Naoki Ono, Kazuhiro Harada, Jun Furukawa, Kazuya Suzuki, Michio Kida, Yasushi Shimanuki

地域環境システム専攻

研究成果: Article › 査読

本文言語	English
ページ（範囲）	503-514
ジャーナル	Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding
巻	1998-1
出版ステータス	Published - 1998 5月 1

引用スタイル

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title = "A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.",

author = "Naoki Ono and Kazuhiro Harada and Jun Furukawa and Kazuya Suzuki and Michio Kida and Yasushi Shimanuki",

year = "1998",

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volume = "1998-1",

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T1 - A Numerical Study on the Macroscopic Kinetics of the Ring-OSF in the Silicon CZ Growth by the Model Using Self-Interstitials as the Dominant Diffusers.

AU - Ono, Naoki

AU - Harada, Kazuhiro

AU - Furukawa, Jun

AU - Suzuki, Kazuya

AU - Kida, Michio

AU - Shimanuki, Yasushi

PY - 1998/5/1

Y1 - 1998/5/1

M3 - Article

VL - 1998-1

SP - 503

EP - 514

JO - Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding

JF - Electrochemical Society "Semiconductor Silicon 1998" meeting proceeding

ER -