Advances in multilayer graphene processes for metallization and high-frequency devices

研究成果: Article査読

抄録

Multilayer graphene (MLG) has been proposed as an alternative material for nanometer-wide interconnects. However, it has not been put to practical use, since the process technology that leads to practical use has been immature. Recent advances in MLG processes and applications, such as MLG-capped copper interconnects, the direct deposition of MLG by solid-phase deposition (SPD) at a low temperature, stable intercalation doping to MLG and selective chemical vapor deposition (CVD) of high-crystallinity MLG for inductor and antenna applications are reviewed. Based on these advances, MLG is considered to be approaching the stage of practical application for device metallization and high-frequency devices. Based on the characteristics of MLG as a conductor and recent development trends, the prospects and issues regarding the future practical use of MLG graphene are discussed.

本文言語English
論文番号SA0802
ジャーナルJapanese Journal of Applied Physics
62
SA
DOI
出版ステータスPublished - 2023 1月 1

ASJC Scopus subject areas

  • 工学一般
  • 物理学および天文学一般

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