Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica

H. Nishikawa, R. Nakamura, Y. Ohki, K. Nagasawa, Y. Hama

研究成果: Article › 査読

本文言語	English
ページ（範囲）	8073-8079
ジャーナル	The American Physical Society
巻	46
出版ステータス	Published - 1992 10月 1

引用スタイル

@article{79d25c893b864148bf8f9f1b4f949d73,

title = "Characterization od ClOx radicals in vacuum-ultraviolet-irradiated high-purity silica",

author = "H. Nishikawa and R. Nakamura and Y. Ohki and K. Nagasawa and Y. Hama",

year = "1992",

month = oct,

day = "1",

language = "English",

volume = "46",

pages = "8073--8079",

journal = "The American Physical Society",

}