Conformal coating of poly(glycidyl methacrylate) as a lithographic polymer by initiated chemical vapor deposition

S. Yoshida, T. Kobayashi, M. Kumano, M. Esashi

研究成果: Conference contribution

抄録

This study reports on the investigation of the conformability and photo and electron beam (EB) patternability of a poly-glycidyl methacrylate (PGMA) film formed by initiated chemical vapor deposition (i-CVD). It is demonstrated that the PGMA film can be conformally deposited on a Si trench structure via i-CVD. In addition, the pattern definition of the film is also successfully demonstrated by deep ultraviolet and EB lithography. These achievements indicate that i-CVD has the potential to become a powerful method to achieve the conformal coating of a lithographic resist.

本文言語English
ホスト出版物のタイトル2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
ページ994-997
ページ数4
DOI
出版ステータスPublished - 2011
外部発表はい
イベント2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing, China
継続期間: 2011 6月 52011 6月 9

出版物シリーズ

名前2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Conference

Conference2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
国/地域China
CityBeijing
Period11/6/511/6/9

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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