抄録
The electron-beam-induced deposition of high-energy electrons by using a subnanometer-sized probe was discussed. The nanometer-sized dots with a diameter of less than 5 nm were also fabricated. It was observed that the deposition period strongly affected the size of the deposits in the transmission electron microscopy (TEM).
| 本文言語 | English |
|---|---|
| ページ（範囲） | 2064-2066 |
| ページ数 | 3 |
| ジャーナル | Applied Physics Letters |
| 巻 | 83 |
| 号 | 10 |
| DOI | |
| 出版ステータス | Published - 2003 9月 8 |
| 外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学（その他）