Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi; M. Shimojo; M. Tanaka; R. Che; W. Zhang; K. Furuya

Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition

M. Takeguchi, M. Shimojo, M. Tanaka, R. Che, W. Zhang, K. Furuya

機能制御システム専攻

研究成果: Article › 査読

本文言語	English
ジャーナル	Default journal
出版ステータス	Published - 2005 12月 1

引用スタイル

@article{89a9ec04fe8542449514d271fd9594fb,

title = "Electron holography studies of the effect of resistance at the wire-wire contact in resistivity measurement of nanowires formed by electron beam induced deposition",

author = "M. Takeguchi and M. Shimojo and M. Tanaka and R. Che and W. Zhang and K. Furuya",

year = "2005",

month = dec,

day = "1",

language = "English",

journal = "Default journal",

}