TY - JOUR
T1 - Ellipsometric studies of optical properties of Er-doped ZnO thin films synthesized by sol-gel method
AU - Miao, Lei
AU - Tanemura, Sakae
AU - Zhao, Lili
AU - Xiao, Xiudi
AU - Zhang, Xiao Ting
N1 - Funding Information:
This work was supported by the National Natural Science Foundation of China (grant nos. 51172234 & 51102235 ), and Guangdong Provincial Department of Science and Technology (grant no. 2011B010100043 ).
PY - 2013/9/30
Y1 - 2013/9/30
N2 - We have reported a low-cost and fast formation of highly efficient Er centers in ZnO thin films. As a high sensitivity tool for the detection of trace of Er dopant in ZnO film, spectroscopic ellipsometry is employed to disclose the systematic interrelationship of the crystallinity, dielectric function and optical band structure. Pure ZnO thin film shows very sharp band structure. The films with 0.05 at.% Er dopant, annealed at 600 C and 800 C, exhibit the similar tendency where the dopant level appears at the band tail. The band structure of the films with 0.05 at.% Er dopant, annealed at 400 C, is very close to that of pure ZnO. While the samples annealed at 1000 C are on the verge of amorphousness, and the flat curve of photon energy dependent εi(E) is observed. The strain effect caused by the formation of ErO6 pseudo-octahedron structure greatly affects the value of dielectric constants. Therefore, SE analyses reveal significant effect of Er doping and annealing temperatures on the modification of optical band structure, dielectric property and optically active center in ZnO films.
AB - We have reported a low-cost and fast formation of highly efficient Er centers in ZnO thin films. As a high sensitivity tool for the detection of trace of Er dopant in ZnO film, spectroscopic ellipsometry is employed to disclose the systematic interrelationship of the crystallinity, dielectric function and optical band structure. Pure ZnO thin film shows very sharp band structure. The films with 0.05 at.% Er dopant, annealed at 600 C and 800 C, exhibit the similar tendency where the dopant level appears at the band tail. The band structure of the films with 0.05 at.% Er dopant, annealed at 400 C, is very close to that of pure ZnO. While the samples annealed at 1000 C are on the verge of amorphousness, and the flat curve of photon energy dependent εi(E) is observed. The strain effect caused by the formation of ErO6 pseudo-octahedron structure greatly affects the value of dielectric constants. Therefore, SE analyses reveal significant effect of Er doping and annealing temperatures on the modification of optical band structure, dielectric property and optically active center in ZnO films.
KW - Dielectric function
KW - Optical band-gap
KW - Spectroscopic ellipsometry
KW - Urbach tail
KW - ZnO:Er thin films
UR - http://www.scopus.com/inward/record.url?scp=84883148071&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84883148071&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2013.02.034
DO - 10.1016/j.tsf.2013.02.034
M3 - Article
AN - SCOPUS:84883148071
SN - 0040-6090
VL - 543
SP - 125
EP - 129
JO - Thin Solid Films
JF - Thin Solid Films
ER -