TY - JOUR
T1 - Evaluation of SiO2 thin films prepared by sol-gel method using photoirradiation
AU - Maekawa, S.
AU - Ohishi, T.
PY - 1994/3/11
Y1 - 1994/3/11
N2 - SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.
AB - SiO2 films were prepared by the sol-gel method using photoirradiation, and the properties microhardness and HF etch rate, etc., were evaluated. The hardness and anti-corrosion in HF of photoirradiated films were superior to films only heated at the same temperature.
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U2 - 10.1016/0022-3093(94)90241-0
DO - 10.1016/0022-3093(94)90241-0
M3 - Letter
AN - SCOPUS:0028760375
SN - 0022-3093
VL - 169
SP - 207
EP - 209
JO - Journal of Non-Crystalline Solids
JF - Journal of Non-Crystalline Solids
IS - 1-2
ER -