@inproceedings{b91876f87fb940d49df4d8a8f4d49807,
title = "Fabrication of Highly Doped MLG Patterns Using Selective CVD and MoCl5Intercalation",
abstract = "Doped MLG is expected as an inductor material with high inductance density due to its high kinetic inductance. A practical fabrication process for doped MLG patterns is developed using a selective CVD on Ni catalyst patterns and stable MoCl5 intercalation. The highly doped MLG patterns of stage-2 were realized by CVD-MLG with a G/D ratio of 20 or more, and the sheet-resistance could be reduced.",
keywords = "CVD, inductor, intercalation doping, MoCl, multilayer graphene",
author = "Ekkaphop Ketsombun and Tomoki Akimoto and Kazuyoshi Ueno",
note = "Funding Information: This work was supported by the Research Center for Green Innovation, SIT. Publisher Copyright: {\textcopyright} 2021 IEEE.; 24th Annual IEEE International Interconnect Technology Conference, IITC 2021 ; Conference date: 06-07-2021 Through 09-07-2021",
year = "2021",
month = jul,
day = "6",
doi = "10.1109/IITC51362.2021.9537349",
language = "English",
series = "2021 IEEE International Interconnect Technology Conference, IITC 2021",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2021 IEEE International Interconnect Technology Conference, IITC 2021",
}