TY - JOUR
T1 - Femtosecond laser-assisted etching of fluoride crystals
AU - Matsuo, Shigeki
AU - Iwasa, Kodai
AU - Tomita, Takuro
AU - Hashimoto, Shuichi
AU - Okada, Tatsuya
PY - 2011/12
Y1 - 2011/12
N2 - Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.
AB - Femtosecond laser-assisted etching is a technique for internal micro removal processing of transparent materials. In the present study, we applied this technique to fluoride crystals of CaF 2 and MgF 2. In the case of CaF 2, selective etching of a femtosecond laser-modified region was observed with etchants of aqueous solutions of nitric acid, sulfuric acid, and hydrogen chloride, while no signature of etching was observed for MgF 2. Microchannels were fabricated in CaF 2 substrates. At the inlet, the microchannel showed polygonal shapes, which may be related to anisotropy in the etching rate.
KW - CaF
KW - Femtosecond laser-assisted etching
KW - Fluoride
KW - MgF
KW - Micromachining
UR - http://www.scopus.com/inward/record.url?scp=84861549312&partnerID=8YFLogxK
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U2 - 10.2961/jlmn.2011.03.0014
DO - 10.2961/jlmn.2011.03.0014
M3 - Article
AN - SCOPUS:84861549312
SN - 1880-0688
VL - 6
SP - 245
EP - 248
JO - Journal of Laser Micro Nanoengineering
JF - Journal of Laser Micro Nanoengineering
IS - 3
ER -