Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources

T.Homma T.Homma; R.Yamaguchi R.Yamaguchi; Y.Murao Y.Murao; Tetsuya Homma

Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources

T.Homma T.Homma, R.Yamaguchi R.Yamaguchi, Y.Murao Y.Murao, Tetsuya Homma

機能制御システム専攻

研究成果: Article › 査読

本文言語	English
ページ（範囲）	3599-3603
ジャーナル	Journal of The Electochemical Society
巻	140
出版ステータス	Published - 1993 12月 1

引用スタイル

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title = "Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources",

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T1 - Flow Characteristics of SiOF Films in Room Temperature Chemical Vapor Deposition Utilizing Fluorotrialkoxysilane Group and Pure Water as Gas Sources

AU - T.Homma, T.Homma

AU - R.Yamaguchi, R.Yamaguchi

AU - Y.Murao, Y.Murao

AU - Homma, Tetsuya

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JO - Journal of The Electochemical Society

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