抄録
Thin films of titanium dioxide (TiO 2 ) with desired crystal phase of anatase or rutile were formed by rf sputtering of a TiO 2 target under precisely controlled process parameters. The application of TiO 2 as the antireflection layers of a TiN-based heat mirror was testified. Optical calculation was done for the heat mirror, and an optimized structure with TiO 2 (30nm)/TiN (30nm)/TiO 2 (30nm) was deposited on SiO 2 glass by sequential sputtering. Optical evaluation of the heat mirror was performed by measuring the transmittance/reflectance with a spectrophotometer in wavelengths 250-2500nm and with a FT-IR system in wavelengths 1-25μm, respectively. Furthermore, it is suggested that a better and a multifunctional performance can mostly be expected through precise control of the crystal structure of the TiO 2 top layer which acts as a photocatalyst.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 775-781 |
| ページ数 | 7 |
| ジャーナル | Applied Surface Science |
| 巻 | 212-213 |
| 号 | SPEC. |
| DOI | |
| 出版ステータス | Published - 2003 5月 15 |
| 外部発表 | はい |
ASJC Scopus subject areas
- 化学 (全般)
- 凝縮系物理学
- 物理学および天文学（全般）
- 表面および界面
- 表面、皮膜および薄膜