Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings

Tomoji Ohishi; Kousei Ichikawa

doi:10.1016/j.matlet.2019.03.115

Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings

Tomoji Ohishi, Kousei Ichikawa

研究成果: Article › 査読

7 被引用数 (Scopus)

抄録

A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO ₂ , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m ² ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices.

本文言語	English
ページ（範囲）	143-146
ページ数	4
ジャーナル	Materials Letters
巻	247
DOI	https://doi.org/10.1016/j.matlet.2019.03.115
出版ステータス	Published - 2019 7月 15

ASJC Scopus subject areas

材料科学（全般）
凝縮系物理学
材料力学
機械工学

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10.1016/j.matlet.2019.03.115

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引用スタイル

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title = "Formation and gas barrier properties of silica thin films formed on heat resistant PET (Polyethylene Terephthalate) substrate by excimer light irradiation to polysilazane coatings",

abstract = " A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO 2 , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m 2 ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices. ",

keywords = "Excimer light irradiation, Flexible electronics, Gas barrier characteristics, Heat-resistant PET film, Polysilazane",

author = "Tomoji Ohishi and Kousei Ichikawa",

note = "Funding Information: This research was partially supported by JSPS KAKENHI (JP 17K06821). Publisher Copyright: {\textcopyright} 2019",

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AB - A solution of polysilazane (Perhydropolysilazane) was applied to a heat resistant PET substrate, and then irradiated with excimer light at 150 °C to form a gas barrier film. This film primarily consisted of a thin layer of SiO 2 , and had very high gas barrier properties, with a water vapor transmission rate of 0.02 g/m 2 ·day or less (40 °C/90% RH). This gas barrier film has good transparency, film adhesion, surface flatness, and flexibility, and since it has high heat resistance and good gas barrier performance, it is expected to have applications in films for flexible devices.

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