Hafnium silicate gate dielectrics in GaN metal oxide semiconductor capacitors
Toshihide Nabatame, Erika Maeda, Mari Inoue, Kazuya Yuge, Masafumi Hirose, Koji Shiozaki, Naoki Ikeda, Tomoji Ohishi, Akihiko Ohi
研究成果: Article › 査読
22
被引用数
(Scopus)