TY - JOUR
T1 - Image correction method for the chemical imaging sensor
AU - Miyamoto, Ko ichiro
AU - Sugawara, Yuri
AU - Kanoh, Shin'ichiro
AU - Yoshinobu, Tatsuo
AU - Wagner, Torsten
AU - Schöning, Michael J.
N1 - Funding Information:
This work was supported by JSPS Grant-in-Aid for Scientific Research (B) (contract no. 19350036). K. Miyamoto acknowledges the financial support from Tateisi Science and Technology Foundation.
PY - 2010/2/17
Y1 - 2010/2/17
N2 - The chemical imaging sensor is a semiconductor-based chemical sensor that can visualize the spatial distribution of chemical species. For the practical application of this sensor, artifacts in the chemical images due to defects of the semiconductor substrate and contamination of the sensing surface etc. have been a major problem. An image correction method was developed to eliminate the influence of nonuniformity of individual sensor plate.
AB - The chemical imaging sensor is a semiconductor-based chemical sensor that can visualize the spatial distribution of chemical species. For the practical application of this sensor, artifacts in the chemical images due to defects of the semiconductor substrate and contamination of the sensing surface etc. have been a major problem. An image correction method was developed to eliminate the influence of nonuniformity of individual sensor plate.
KW - Calibration
KW - Chemical imaging sensor
KW - Image correction
KW - Light-addressable potentiometric sensor (LAPS)
UR - http://www.scopus.com/inward/record.url?scp=75749088940&partnerID=8YFLogxK
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U2 - 10.1016/j.snb.2008.10.069
DO - 10.1016/j.snb.2008.10.069
M3 - Article
AN - SCOPUS:75749088940
SN - 0925-4005
VL - 144
SP - 344
EP - 348
JO - Sensors and Actuators B: Chemical
JF - Sensors and Actuators B: Chemical
IS - 2
ER -