Improved characteristics of GaN-based light-emitting diodes by distributed Bragg reflector grown on Si

H. Ishikawa, K. Asano, B. Zhang, T. Egawa, T. Jimbo

研究成果: Article査読

36 被引用数 (Scopus)

抄録

We report the improved characteristics of GaInN light-emitting diodes (LEDs) on Si substrates by a distributed Bragg reflector (DBR). The DBR-based GaInN multi quantum-well LED structures were grown on n-Si (111) substrates using a conventional horizontal metalorganic chemical vapor deposition method. The number of Al0.3Ga0.7N/AlN pairs in the DBR was changed from 1 to 5. The measured PL peak intensity ratio agrees well with the calculated value. In an EL measurement, the output power increases with an increase in the number of pairs in the DBR (less than 3 pairs). The light output power of a 3-pair DBR-based LED is approximately twofold larger than that of a non-DBR-based LED. However, it significantly decreases in a 5 pair of DBR, because of a crack formation. Although the suppression of crack formation remains a problem, the DBR is still very promising for the fabrication of high-performance LEDs on Si.

本文言語English
ページ(範囲)2653-2657
ページ数5
ジャーナルPhysica Status Solidi (A) Applied Research
201
12
DOI
出版ステータスPublished - 2004 9月 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

フィンガープリント

「Improved characteristics of GaN-based light-emitting diodes by distributed Bragg reflector grown on Si」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル