In-situ ion and electron beam effects on the fabrication and analysis of nanomaterials

Kazuo Furuya, Minghui Song, Masayuki Shimojo

研究成果: Chapter

1 被引用数 (Scopus)

抄録

Ion implantation causes the formation of nano-phases as well as radiation damage. “In-situ” observation in a TEM is a unique technique to clarify such phenomena. One example is Xe nanocrystals embedded in a metal matrix. HRTEM observations revealed the atomic structures and the motion of atoms in a Xe nanocrystal. Electron beam-induced deposition is another technique to fabricate nano-structures. Nanostructures having desired shape and size can be obtained. Metal atoms are deposited using focused electron beam irradiation under the presence of a small amount of precursor gas molecules on the substrate. The details of these ion and electron beam effects are reviewed.

本文言語English
ホスト出版物のタイトルIn-Situ Electron Microscopy at High Resolution
出版社World Scientific Publishing Co.
ページ229-258
ページ数30
ISBN(電子版)9789812797346
ISBN(印刷版)9812797335, 9789812797339
DOI
出版ステータスPublished - 2008 1月 1
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 材料科学(全般)

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