TY - GEN
T1 - Lithography using focused high-energy proton beam for fabrication of high-aspect-ratio microstructures
AU - Nishikawa, H.
AU - Furuta, Y.
AU - Uchiya, N.
AU - Haga, J.
AU - Oikawa, M.
AU - Satoh, T.
AU - Ishii, Y.
AU - Kamiya, T.
PY - 2007/12/1
Y1 - 2007/12/1
N2 - We demonstrated fabrication of high-aspect ratio structures by proton beam writing on positive and negative resists. High aspect ratio up to 20 and smallest feature size up to 130 nm were achieved. The depth of machining is controlled so accurately by the beam injection energy. We succeeded in the production of three dimension micro-structures, 'Arch of Triumph', by double drawing on the same resist-sample by two kinds of microbeams with different energies and with different patterns. This shows a unique feature of the PBW as a micromachining tool for multilevel microstructures.
AB - We demonstrated fabrication of high-aspect ratio structures by proton beam writing on positive and negative resists. High aspect ratio up to 20 and smallest feature size up to 130 nm were achieved. The depth of machining is controlled so accurately by the beam injection energy. We succeeded in the production of three dimension micro-structures, 'Arch of Triumph', by double drawing on the same resist-sample by two kinds of microbeams with different energies and with different patterns. This shows a unique feature of the PBW as a micromachining tool for multilevel microstructures.
UR - http://www.scopus.com/inward/record.url?scp=47349092552&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=47349092552&partnerID=8YFLogxK
U2 - 10.1109/IMNC.2007.4456107
DO - 10.1109/IMNC.2007.4456107
M3 - Conference contribution
AN - SCOPUS:47349092552
SN - 4990247248
SN - 9784990247249
T3 - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
SP - 66
EP - 67
BT - Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
T2 - s20th International Microprocesses and Nanotechnology Conference, MNC 2007
Y2 - 5 November 2007 through 8 November 2007
ER -