Lithography using focused high-energy proton beam for fabrication of high-aspect-ratio microstructures

H. Nishikawa, Y. Furuta, N. Uchiya, J. Haga, M. Oikawa, T. Satoh, Y. Ishii, T. Kamiya

研究成果: Conference contribution

1 被引用数 (Scopus)

抄録

We demonstrated fabrication of high-aspect ratio structures by proton beam writing on positive and negative resists. High aspect ratio up to 20 and smallest feature size up to 130 nm were achieved. The depth of machining is controlled so accurately by the beam injection energy. We succeeded in the production of three dimension micro-structures, 'Arch of Triumph', by double drawing on the same resist-sample by two kinds of microbeams with different energies and with different patterns. This shows a unique feature of the PBW as a micromachining tool for multilevel microstructures.

本文言語English
ホスト出版物のタイトルDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
ページ66-67
ページ数2
DOI
出版ステータスPublished - 2007 12月 1
イベントs20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
継続期間: 2007 11月 52007 11月 8

出版物シリーズ

名前Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Conference

Conferences20th International Microprocesses and Nanotechnology Conference, MNC 2007
国/地域Japan
CityKyoto
Period07/11/507/11/8

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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