Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching

Hideki Yokoi; Tetsuya Mizumoto; Takehiro Ida; Kazuki Kozakai Kozakai; Yoshiyuki Naito

doi:10.1143/JJAP.33.6355

Loss increase of (LuNdBi)₃(FeAl)₅ O₁₂ films caused by sputter etching

Hideki Yokoi, Tetsuya Mizumoto, Takehiro Ida, Kazuki Kozakai Kozakai, Yoshiyuki Naito

研究成果: Article › 査読

抄録

Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)₃(FeAl)₅O₁₂ (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar⁺ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO₂ mask deposited onto LNB film instead of a Ti mask.

本文言語	English
ページ（範囲）	635-639
ページ数	5
ジャーナル	Japanese Journal of Applied Physics
巻	33
号	11R
DOI	https://doi.org/10.1143/JJAP.33.6355
出版ステータス	Published - 1994 11月
外部発表	はい

ASJC Scopus subject areas

工学（全般）
物理学および天文学（全般）

文献へのアクセス

10.1143/JJAP.33.6355

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引用スタイル

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title = "Loss increase of (LuNdBi)3(FeAl)5 O12 films caused by sputter etching",

abstract = "Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.",

keywords = "(LuNdBi)(FeAl) O, Optical absorption loss, Reactive ion etching, Rib waveguide, Sputter etching, X-ray photoelectron spectroscopy",

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AU - Yokoi, Hideki

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AU - Naito, Yoshiyuki

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AB - Rib waveguides, which are made of magnetic garnet films of composition (LuNdBi)3(FeAl)5O12 (LNB), fabricated by Ar sputter etching have large propagation loss in comparison with LNB slab waveguides. X-ray photoelectron spectroscopy (XPS) is used to investigate chemical states of constituent elements existing in the surface layer where a Ti mask has been deposited during the etching process. The analysis shows that Fe chemical shift due to Ar+ ion bombardment can cause increase in the optical absorption loss, and hence the propagation loss. It is effective for suppressing the loss increase to employ a SiO2 mask deposited onto LNB film instead of a Ti mask.

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