Microbeam complex at TIARA: Technologies to meet a wide range of applications

T. Kamiya, K. Takano, T. Satoh, Y. Ishii, H. Nishikawa, S. Seki, M. Sugimoto, S. Okumura, M. Fukuda

研究成果: Article査読

18 被引用数 (Scopus)


Since 1990 R&Ds of microbeam technology has been progressed at the TIARA facility of JAEA Takasaki. In order to meet a wide variety of ion beam applications, analysis, radiation effect studies, or fabrication in regions of micro- or nano-structures, three different types of ion microbeam systems were developed. In these systems, high-spatial resolutions have been achieved and techniques of micro-PIXE, single ion hit and particle beam writing (PBW) were also developed for these applications. Microbeams, on the other hand, require the highest quality of beams from the accelerators, the cyclotron in particular, which was an important part of the microbeam technology of TIARA. In this paper, the latest progress of the ion microbeam technology and applications are summarized and a future prospect of them is discussed.

ジャーナルNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
出版ステータスPublished - 2011 10月 15

ASJC Scopus subject areas

  • 核物理学および高エネルギー物理学
  • 器械工学


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