Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry

Suraj Gopalakrishnan, Kenta Ono, Mikihiro Nomura, Takashi Sugawara, Hiromitsu Takaba, Shin-ichi Nakao

研究成果: Article › 査読

本文言語	English
ページ（範囲）	3263-3266
ジャーナル	Transactions of the Materials Research Society of Japan
巻	29
出版ステータス	Published - 2004 11月 1

引用スタイル

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title = "Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry",

author = "Suraj Gopalakrishnan and Kenta Ono and Mikihiro Nomura and Takashi Sugawara and Hiromitsu Takaba and Shin-ichi Nakao",

year = "2004",

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T1 - Microporous Silica Membrane Prepared using TMOS/O3 CVD in Opposing Reactants Geometry

AU - Gopalakrishnan, Suraj

AU - Ono, Kenta

AU - Nomura, Mikihiro

AU - Sugawara, Takashi

AU - Takaba, Hiromitsu

AU - Nakao, Shin-ichi

PY - 2004/11/1

Y1 - 2004/11/1

M3 - Article

VL - 29

SP - 3263

EP - 3266

JO - Transactions of the Materials Research Society of Japan

JF - Transactions of the Materials Research Society of Japan

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