Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Katsuyoshi Takano; Atsushi Asano; Yuta Maeyoshi; Hiromi Marui; Masaaki Omichi; Akinori Saeki; Shu Seki; Takahiro Satoh; Yasuyuki Ishii; Tomihiro Kamiya; Masashi Koka; Takeru Ohkubo; Masaki Sugimoto; Hiroyuki Nishikawa

doi:10.2494/photopolymer.25.43

Microprocessing of arched bridge structures with epoxy resin by proton beam writing

Katsuyoshi Takano, Atsushi Asano, Yuta Maeyoshi, Hiromi Marui, Masaaki Omichi, Akinori Saeki, Shu Seki, Takahiro Satoh, Yasuyuki Ishii, Tomihiro Kamiya, Masashi Koka, Takeru Ohkubo, Masaki Sugimoto, Hiroyuki Nishikawa

研究成果: Article › 査読

2 被引用数 (Scopus)

本文言語	English
ページ（範囲）	43-46
ページ数	4
ジャーナル	Journal of Photopolymer Science and Technology
巻	25
号	1
DOI	https://doi.org/10.2494/photopolymer.25.43
出版ステータス	Published - 2012

ASJC Scopus subject areas

ポリマーおよびプラスチック
有機化学
材料化学

文献へのアクセス

10.2494/photopolymer.25.43

他のファイルとリンク

引用スタイル

@article{c76e4df8d56a40be99e61db42e61fcdd,

title = "Microprocessing of arched bridge structures with epoxy resin by proton beam writing",

keywords = "Photolithography, Proton beam writing, SU-8 photoresist, Supercritical drying, Three dimensional structure",

author = "Katsuyoshi Takano and Atsushi Asano and Yuta Maeyoshi and Hiromi Marui and Masaaki Omichi and Akinori Saeki and Shu Seki and Takahiro Satoh and Yasuyuki Ishii and Tomihiro Kamiya and Masashi Koka and Takeru Ohkubo and Masaki Sugimoto and Hiroyuki Nishikawa",

year = "2012",

doi = "10.2494/photopolymer.25.43",

language = "English",

volume = "25",

pages = "43--46",

journal = "Journal of Photopolymer Science and Technology",

issn = "0914-9244",

publisher = "Tokai University",

number = "1",

}

TY - JOUR

T1 - Microprocessing of arched bridge structures with epoxy resin by proton beam writing

AU - Takano, Katsuyoshi

AU - Asano, Atsushi

AU - Maeyoshi, Yuta

AU - Marui, Hiromi

AU - Omichi, Masaaki

AU - Saeki, Akinori

AU - Seki, Shu

AU - Satoh, Takahiro

AU - Ishii, Yasuyuki

AU - Kamiya, Tomihiro

AU - Koka, Masashi

AU - Ohkubo, Takeru

AU - Sugimoto, Masaki

AU - Nishikawa, Hiroyuki

PY - 2012

Y1 - 2012

KW - Photolithography

KW - Proton beam writing

KW - SU-8 photoresist

KW - Supercritical drying

KW - Three dimensional structure

UR - http://www.scopus.com/inward/record.url?scp=84864465968&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84864465968&partnerID=8YFLogxK

U2 - 10.2494/photopolymer.25.43

DO - 10.2494/photopolymer.25.43

M3 - Article

AN - SCOPUS:84864465968

SN - 0914-9244

VL - 25

SP - 43

EP - 46

JO - Journal of Photopolymer Science and Technology

JF - Journal of Photopolymer Science and Technology

IS - 1

ER -