Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS

Yoichi Arai; Sou Watanabe; Shimpei Ohno; Kazunori Nomura; Fumiya Nakamura; Tsuyoshi Arai; Noriaki Seko; Hiroyuki Hoshina; Naoto Hagura; Toshio Kubota

doi:10.1016/j.nimb.2019.10.028

Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS

Yoichi Arai, Sou Watanabe, Shimpei Ohno, Kazunori Nomura, Fumiya Nakamura, Tsuyoshi Arai, Noriaki Seko, Hiroyuki Hoshina, Naoto Hagura, Toshio Kubota

研究成果: Article › 査読

2 被引用数 (Scopus)

抄録

Radioactive spent solvent waste containing U and Pu is generated from reprocessing process of spent nuclear fuel. The nuclear materials removal is important for safety storage or disposal. Imino diacetic acid (IDA) type chelating resin is promising adsorbent, and its characterization is performed by Particle Induced X-ray Emission (PIXE) and Extended X-ray Absorption Fine Structure (EXAFS) analyses on Zr in order to evaluate adsorption mechanism. PIXE succeeded in quantitative analysis on few microgram of adsorbed Zr, and EXAFS suggested that Zr in the aqueous solution and in the solvent can be trapped by IDA group with different mechanisms.

本文言語	English
ページ（範囲）	54-59
ページ数	6
ジャーナル	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
巻	477
DOI	https://doi.org/10.1016/j.nimb.2019.10.028
出版ステータス	Published - 2020 8月 15

ASJC Scopus subject areas

核物理学および高エネルギー物理学
器械工学

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10.1016/j.nimb.2019.10.028

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引用スタイル

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title = "Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS",

abstract = "Radioactive spent solvent waste containing U and Pu is generated from reprocessing process of spent nuclear fuel. The nuclear materials removal is important for safety storage or disposal. Imino diacetic acid (IDA) type chelating resin is promising adsorbent, and its characterization is performed by Particle Induced X-ray Emission (PIXE) and Extended X-ray Absorption Fine Structure (EXAFS) analyses on Zr in order to evaluate adsorption mechanism. PIXE succeeded in quantitative analysis on few microgram of adsorbed Zr, and EXAFS suggested that Zr in the aqueous solution and in the solvent can be trapped by IDA group with different mechanisms.",

keywords = "Chelating resin, EXAFS, Micro-PIXE, Spent solvent, Zr recovery",

author = "Yoichi Arai and Sou Watanabe and Shimpei Ohno and Kazunori Nomura and Fumiya Nakamura and Tsuyoshi Arai and Noriaki Seko and Hiroyuki Hoshina and Naoto Hagura and Toshio Kubota",

year = "2020",

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doi = "10.1016/j.nimb.2019.10.028",

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T1 - Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS

AU - Arai, Yoichi

AU - Watanabe, Sou

AU - Ohno, Shimpei

AU - Nomura, Kazunori

AU - Nakamura, Fumiya

AU - Arai, Tsuyoshi

AU - Seko, Noriaki

AU - Hoshina, Hiroyuki

AU - Hagura, Naoto

AU - Kubota, Toshio

PY - 2020/8/15

Y1 - 2020/8/15

N2 - Radioactive spent solvent waste containing U and Pu is generated from reprocessing process of spent nuclear fuel. The nuclear materials removal is important for safety storage or disposal. Imino diacetic acid (IDA) type chelating resin is promising adsorbent, and its characterization is performed by Particle Induced X-ray Emission (PIXE) and Extended X-ray Absorption Fine Structure (EXAFS) analyses on Zr in order to evaluate adsorption mechanism. PIXE succeeded in quantitative analysis on few microgram of adsorbed Zr, and EXAFS suggested that Zr in the aqueous solution and in the solvent can be trapped by IDA group with different mechanisms.

AB - Radioactive spent solvent waste containing U and Pu is generated from reprocessing process of spent nuclear fuel. The nuclear materials removal is important for safety storage or disposal. Imino diacetic acid (IDA) type chelating resin is promising adsorbent, and its characterization is performed by Particle Induced X-ray Emission (PIXE) and Extended X-ray Absorption Fine Structure (EXAFS) analyses on Zr in order to evaluate adsorption mechanism. PIXE succeeded in quantitative analysis on few microgram of adsorbed Zr, and EXAFS suggested that Zr in the aqueous solution and in the solvent can be trapped by IDA group with different mechanisms.

KW - Chelating resin

KW - EXAFS

KW - Micro-PIXE

KW - Spent solvent

KW - Zr recovery

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JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

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Microscopic analyses on Zr adsorbed IDA chelating resin by PIXE and EXAFS

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