抄録
We have developed a new technique for monitoring the concentration of reaction products during puddle development in ultralarge-scale integration (ULSI) lithography. Optical measurement has been employed for monitoring the concentration of reaction products by detecting reflected light from a wafer surface, and compared with the sampling method (UV-visible spectroscopy) for reaction products from a developer solution. A correlation coefficient of 0.89 was obtained, indicating a good correlation between this optical method and sampling method. We concluded that the newly developed optical monitoring technique is useful for measuring the concentration of reaction products.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 128-130 |
| ページ数 | 3 |
| ジャーナル | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
| 巻 | 46 |
| 号 | 1 |
| DOI | |
| 出版ステータス | Published - 2007 1月 10 |
ASJC Scopus subject areas
- 工学（全般）
- 物理学および天文学（全般）