TY - JOUR
T1 - Nano-fabrication using electron-beam-induced deposition combined with low energy ion milling
AU - Mitsuishi, K.
AU - Shimojo, M.
AU - Tanaka, M.
AU - Furuya, K.
PY - 2006/1/1
Y1 - 2006/1/1
N2 - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.
AB - A fabrication technique combining electron-beam-induced deposition and low energy ion milling is suggested. Nanosized deposits fabricated by electron-beam-induced deposition are used as masks for low energy ion milling so that the substrate regions covered with the nano-sized deposits form nanostructures. A check by high-resolution electron microscopy showed that the method can be used to fabricate nanometer-sized structures from various materials with high crystallinity which is very important for device applications.
KW - Electron-beam-induced deposition
KW - Ion-beam milling
KW - Nano-fabrication
UR - http://www.scopus.com/inward/record.url?scp=28544436628&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=28544436628&partnerID=8YFLogxK
U2 - 10.1016/j.nimb.2005.08.022
DO - 10.1016/j.nimb.2005.08.022
M3 - Article
AN - SCOPUS:28544436628
SN - 0168-583X
VL - 242
SP - 244
EP - 246
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 1-2
ER -