Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation

Tomoji Ohishi, S. Sone, K Yanagida

研究成果: Article › 査読

引用スタイル

@article{a5c3771a294d46b1bf9d0f481f9ad90e,

title = "Preparation and gas barrier characteristics of polysilazane-derived silica thin films using ultraviolet irradiation",

author = "Tomoji Ohishi and S. Sone and K Yanagida",

year = "2014",

language = "English",

volume = "5",

pages = "105--111",

journal = "Scientific Reports",

issn = "2045-2322",

publisher = "Nature Publishing Group",

}