Preparation and Properties of Anti-Reflection/Anti-Static Thin Films for Cathode Ray Tubes Prepared by Sol-Gel Method Using Photoirradiation

T. Ohishi, S. Maekawa, T. Ishikawa, D. Kamoto

研究成果: Article査読

16 被引用数 (Scopus)

抄録

A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.

本文言語English
ページ(範囲)511-515
ページ数5
ジャーナルJournal of Sol-Gel Science and Technology
8
1-3
DOI
出版ステータスPublished - 1997 1月 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • セラミックおよび複合材料
  • 化学 (全般)
  • 生体材料
  • 凝縮系物理学
  • 材料化学

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