抄録
A new technique for preparing anti-reflection/anti-static thin films for CRTs at low temperature has been developed. Double-layered films of SiO2/SnO2 were formed on a CRT panel surface by the sol-gel method using photoirradiation. The new method makes it possible to reduce heat treatment temperature (°C) by almost 50% and treatment time to approximately 33% of the conventional levels.
本文言語 | English |
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ページ(範囲) | 511-515 |
ページ数 | 5 |
ジャーナル | Journal of Sol-Gel Science and Technology |
巻 | 8 |
号 | 1-3 |
DOI | |
出版ステータス | Published - 1997 1月 1 |
外部発表 | はい |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- セラミックおよび複合材料
- 化学 (全般)
- 生体材料
- 凝縮系物理学
- 材料化学