Preparation and wear resistance of TiBC, TiBN, SiN_x single layer film and TiBC-SiN_x and TiBN-SiN_x double layer film by thermal plasma CVD

Chemical Compounds

• Thermal Plasma 78%
• Plasma Chemical Vapour Deposition 74%
• Wear 51%
• Resistance 34%
• Liquid Film 26%
• Hexamethyldisiloxane 12%
• Borate 8%
• X-Ray Photoelectron Spectroscopy 6%
• Amorphous Material 6%
• Scanning Electron Microscopy 5%

Engineering & Materials Science

• Plasma CVD 100%
• Wear resistance 51%
• Hot Temperature 26%
• Chemical vapor deposition 21%
• Borates 13%
• X ray photoelectron spectroscopy 11%
• Crystalline materials 9%
• Energy dispersive spectroscopy 9%
• Titanium 8%
• Thin films 8%
• Plasmas 8%
• Scanning electron microscopy 7%
• Substrates 6%