Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections

T.Homma T.Homma; Y.Murao Y.Murao; Tetsuya Homma

Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections

T.Homma T.Homma, Y.Murao Y.Murao, Tetsuya Homma

機能制御システム専攻

研究成果: Article › 査読

本文言語	English
ページ（範囲）	15-21
ジャーナル	Thin Solid Films
巻	249
出版ステータス	Published - 1994 9月 1

引用スタイル

@article{867dd42a1b1e4d5d8fa027a54a9da901,

title = "Properties of Liquid Phase Deposited SiO2 Films for Interlayer Dielectrics in Ultra-large-scale Integrated Circuit Multilevel Interconnections",

author = "T.Homma T.Homma and Y.Murao Y.Murao and Tetsuya Homma",

year = "1994",

month = sep,

day = "1",

language = "English",

volume = "249",

pages = "15--21",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}