Resolution performance of programmable proximity aperture MeV ion beam lithography system

Engineering & Materials Science

• Computer control 57%
• Heavy ions 70%
• Ion beam lithography 100%
• Particle accelerators 50%
• Ray tracing 57%
• Scattering 46%

Physics & Astronomy

• accelerators 6%
• apertures 38%
• blades 33%
• divergence 7%
• heavy ions 7%
• ion beams 38%
• light ions 10%
• lithography 41%
• performance 21%
• proximity 47%
• ray tracing 8%
• scattering 4%
• sharpness 19%
• simulation 3%
• spatial resolution 6%

Chemical Compounds

• Dimension 37%
• Heavy Ion 68%
• Ion Beam 54%
• Simulation 31%