抄録
Two-dimensional transient simulations of AlGaAs/GaAs HFETs are performed in which substrate traps and surface states are considered. When the drain voltage is raised abruptly, the drain current overshoots the steady-state value, and when it is lowered abruptly, the drain current remains at a low value, showing drain-lag behavior. Turn-on characteristics are also calculated when both the gate voltage and the drain voltage are changed abruptly, and quasi-pulsed I-V curves are derived from them. It is shown that the drain lag due to substrate traps could become a cause of so-called current compression of the HFETs. It is also shown that gate lag due to surface states could become a major cause of the current compression.
本文言語 | English |
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ページ(範囲) | 357-360 |
ページ数 | 4 |
ジャーナル | Journal of Computational Electronics |
巻 | 5 |
号 | 4 |
DOI | |
出版ステータス | Published - 2006 12月 1 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 原子分子物理学および光学
- モデリングとシミュレーション
- 電子工学および電気工学