Surface amorphization in Zr alloy films via Ni implantation

Shinji Muraishi, Hirono Naito, Tatuhiko Aizawa

研究成果: Conference contribution

1 被引用数 (Scopus)


Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.

ホスト出版物のタイトルSurfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine
出版ステータスPublished - 2006 12月 1
イベント135th TMS Annual Meeting, 2006 - San Antonio, TX, United States
継続期間: 2006 3月 122006 3月 16


名前TMS Annual Meeting


Conference135th TMS Annual Meeting, 2006
国/地域United States
CitySan Antonio, TX

ASJC Scopus subject areas

  • 凝縮系物理学
  • 材料力学
  • 金属および合金


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