@inproceedings{b45c6528b32c4a02a60242ca16c7aa13,
title = "Surface amorphization in Zr alloy films via Ni implantation",
abstract = "Ni-implantation has been conducted for sputter-deposited Zr and Zr-Cu films to investigate surface amorphization behavior in proportion to Ni by transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The film of Zr and Zr-Cu with the thickness of 200 nm has been prepared on (001) Si substrate with the certain area fraction of target materials. As deposited films show columnar hcp-Zr and nano-crystalline hcp-Zr(Cu). Ni-implantation induced surface amorphization of Zr and Zr-Cu with thickness of ∼100nm in depth. The critical concentration for amorphization via Ni implantation is calculated to be 20at%Ni for Zr, 6at%Ni for Zr-Cu film. The lower Ni concentration for amorphization of Zr-Cu might be attributed to the chemical interaction of Ni with Zr and Cu according to the negative heat of mixing.",
keywords = "Ion implantation, Metallic glass, Solid-state amorphization, Zr-Cu film",
author = "Shinji Muraishi and Hirono Naito and Tatuhiko Aizawa",
year = "2006",
month = dec,
day = "1",
language = "English",
isbn = "087339626X",
series = "TMS Annual Meeting",
pages = "23--27",
booktitle = "Surfaces and Interfaces in Nanostructured Materials II - Proceedings of Symposium sponsored by the Surface Engineering Committee of the Materials Processing and Manufacturing Division(MPMD)of The Mine",
note = "135th TMS Annual Meeting, 2006 ; Conference date: 12-03-2006 Through 16-03-2006",
}