Thermal Analysis of the Double-Crucible Method in Continuous Silicon Czochralski Processing

Naoki Ono, Michio Kida, Yoshiaki Arai, Kensho Sahira

研究成果: Article査読

6 被引用数 (Scopus)

抄録

Numerical simulations were performed for the melt temperature and convection in a double-crucible method. The k-epsilon turbulent flow model was applied and its results were compared to the experimental data. The calculation using the k -epsilon model converged successfully to a stable solution, while that with the laminar flow model did not. By the application of the k -epsilon model, we could simulate the temperature gradient in the thickness of the inner quartz crucible and the forced convection under the crystal. Moreover, the conclusion that the time-averaged isotherms were not much deformed was investigated from the model.

本文言語English
ページ(範囲)2106-2111
ページ数6
ジャーナルJournal of the Electrochemical Society
140
7
DOI
出版ステータスPublished - 1993 7月
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

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