TY - JOUR
T1 - Thickness-Dependent Nonlinear Electrical Conductivity of Few-Layer Muscovite Mica
AU - Arora, Ankit
AU - Ganapathi, Kolla Lakshmi
AU - Dixit, Tejendra
AU - Miryala, Muralidhar
AU - Masato, Murakami
AU - Rao, M. S.Ramachandra
AU - Krishnan, Ananth
N1 - Funding Information:
This work was supported in part by the Department of Science and Technology, Government of India (DST-GoI), which lead to the establishment of the Nano Functional Materials Technology Centre (NFMTC) (Grants No. SR/NM/NAT/02-2005 and No. DST/NM/JIIT-01/2016(C)), in part by the Japan Student Services Organization for the advanced Project Based Learning (aPBL), and in part by the Shibaura Institute of Technology under the Top Global University Project, designed by the Ministry of Education, Culture, Sports, Science and Technology in Japan. A.A. would like to thank Mr. Nirjhar Kumar for fruit-full discussions. K.L.G. acknowledges the financial support from the DST-GoI, with Sanction Order No. DST/INSPIRE/04/2016/001865 under the DST “Innovation in Science Pursuit for Inspired Research” (INSPIRE) Faculty program.
Publisher Copyright:
© 2022 authors. Published by the American Physical Society.
PY - 2022/6
Y1 - 2022/6
N2 - We report on the direct current (dc) current-voltage (I-V) characteristics of few-layer muscovite mica (MuM) flakes exfoliated and transferred onto SiO2/Si substrate, under different substrate dc bias voltages. Contrary to usual observations in conventional two-dimensional systems, we observe an increase in the in-plane electrical conductivity with a reducing thickness of MuM flakes. At a given voltage, the electrical conductivity of approximately five-layered MuM flake (T3) is 3 orders of magnitude larger than that in approximately ten-layered MuM flake (T2). The I-V characteristics are used to analyze the mechanism of conduction. The model-based analysis reveals the hopping-conduction mechanism to be dominant as compared to the Poole-Frenkel effect. The thickness-dependent work function is measured using Kelvin probe force microscopy for a MuM flake on Si substrate. Assuming that the measured work function is correlated with the Fermi level, we report an upward movement of the Fermi level, toward the conduction band with the reducing thickness of MuM flakes, indicating an increase in the conduction-band carrier density. The observed increase in conductivity in T3 when compared to T2 may be attributed to surface doping due to the increased contribution from K+ ions and lattice relaxation. Our results show that there is a possibility of using few-layer mica as a wide-band-gap semiconductor and that it can open up different avenues for two-dimensional electronic devices.
AB - We report on the direct current (dc) current-voltage (I-V) characteristics of few-layer muscovite mica (MuM) flakes exfoliated and transferred onto SiO2/Si substrate, under different substrate dc bias voltages. Contrary to usual observations in conventional two-dimensional systems, we observe an increase in the in-plane electrical conductivity with a reducing thickness of MuM flakes. At a given voltage, the electrical conductivity of approximately five-layered MuM flake (T3) is 3 orders of magnitude larger than that in approximately ten-layered MuM flake (T2). The I-V characteristics are used to analyze the mechanism of conduction. The model-based analysis reveals the hopping-conduction mechanism to be dominant as compared to the Poole-Frenkel effect. The thickness-dependent work function is measured using Kelvin probe force microscopy for a MuM flake on Si substrate. Assuming that the measured work function is correlated with the Fermi level, we report an upward movement of the Fermi level, toward the conduction band with the reducing thickness of MuM flakes, indicating an increase in the conduction-band carrier density. The observed increase in conductivity in T3 when compared to T2 may be attributed to surface doping due to the increased contribution from K+ ions and lattice relaxation. Our results show that there is a possibility of using few-layer mica as a wide-band-gap semiconductor and that it can open up different avenues for two-dimensional electronic devices.
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U2 - 10.1103/PhysRevApplied.17.064042
DO - 10.1103/PhysRevApplied.17.064042
M3 - Article
AN - SCOPUS:85133691103
SN - 2331-7019
VL - 17
JO - Physical Review Applied
JF - Physical Review Applied
IS - 6
M1 - 064042
ER -