TY - JOUR
T1 - Three-dimensional recording by femtosecond pulses in dielectrics
AU - Juodkazis, Saulius
AU - Kondo, Toshiaki
AU - Mizeikis, Vygantas
AU - Matsuo, Shigeki
AU - Murata, Hiroyuki
AU - Misawa, Hiroaki
N1 - Copyright:
Copyright 2008 Elsevier B.V., All rights reserved.
PY - 2003
Y1 - 2003
N2 - Fabrication and characteristics of two-dimensional (2D) and three-dimensional (3D) periodic structures, recorded in the bulk of SU8 photoresist film by multiple-beam interference is described. Multiple beams (up to nine) were generated by a diffractive beam splitter. Recording was performed by ultrashort laser pulses with temporal width of 140 fs (FVWM) and central wavelength of 800 nm, derived from a Ti:sapphire laser. Intensity-dependent photomodification of the photoresist was due to single-photon as well as multi-photon (two and three) absorption. After the development, the exposed resist films contained free-standing 2D and 3D periodic dielectric structures with unexposed exposed regions removed by the development. Detailed examination of the samples has revealed close resemblance between their structure and the light intensity distributions in the multiple-beam interference fields, expected from the numerical calculations. Quality of the samples recorded by a single-photon absorption was lower than that of that of other samples, in particular due to poor development quality. The microfabrication method used in this work appears to be a suitable for obtaining photonic crystal templates.
AB - Fabrication and characteristics of two-dimensional (2D) and three-dimensional (3D) periodic structures, recorded in the bulk of SU8 photoresist film by multiple-beam interference is described. Multiple beams (up to nine) were generated by a diffractive beam splitter. Recording was performed by ultrashort laser pulses with temporal width of 140 fs (FVWM) and central wavelength of 800 nm, derived from a Ti:sapphire laser. Intensity-dependent photomodification of the photoresist was due to single-photon as well as multi-photon (two and three) absorption. After the development, the exposed resist films contained free-standing 2D and 3D periodic dielectric structures with unexposed exposed regions removed by the development. Detailed examination of the samples has revealed close resemblance between their structure and the light intensity distributions in the multiple-beam interference fields, expected from the numerical calculations. Quality of the samples recorded by a single-photon absorption was lower than that of that of other samples, in particular due to poor development quality. The microfabrication method used in this work appears to be a suitable for obtaining photonic crystal templates.
KW - Holographic recording
KW - Photonic crystals
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U2 - 10.1117/12.479405
DO - 10.1117/12.479405
M3 - Conference article
AN - SCOPUS:0344430219
SN - 0277-786X
VL - 4977
SP - 94
EP - 107
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
T2 - PROCEEDINGS OF SPIE SPIE - The International Society for Optical Engineering: Photon Processing in Microelectronics and Photonics II
Y2 - 27 January 2003 through 30 January 2003
ER -