Ultimate sized nano-dots formed by electron beam-induced deposition using an ultrahigh vacuum transmission electron microscope

M. Tanaka; M. Shimojo; M. Han; K. Mitsuishi; K. Furuya

doi:10.1002/sia.1978

Ultimate sized nano-dots formed by electron beam-induced deposition using an ultrahigh vacuum transmission electron microscope

M. Tanaka, M. Shimojo, M. Han, K. Mitsuishi, K. Furuya

研究成果: Article › 査読

50 被引用数 (Scopus)

抄録

We have successfully fabricated nano-dots containing tungsten or gold from metal-organic gas sources by electron beam-induced deposition in an ultrahigh vacuum transmission electron microscope. The size of the dots can be controlled by changing the time for irradiation and the partial pressure of the precursor. The smallest particle size fabricated from W(CO)₆ is ∼1.5 nm in diameter, which is close to the theoretical resolution limit.

本文言語	English
ページ（範囲）	261-264
ページ数	4
ジャーナル	Surface and Interface Analysis
巻	37
号	2
DOI	https://doi.org/10.1002/sia.1978
出版ステータス	Published - 2005 2月
外部発表	はい

ASJC Scopus subject areas

化学 (全般)
凝縮系物理学
表面および界面
表面、皮膜および薄膜
材料化学

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10.1002/sia.1978

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引用スタイル

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AU - Mitsuishi, K.

AU - Furuya, K.

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KW - Induced deposition (EBID)

KW - Nano-dot

KW - STEM

KW - TEM

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