Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer

K.Ueno K.Ueno, A.Sekiguchi A.Sekiguchi, A.Kobayashi A.Kobayashi, Kazuyoshi Ueno

研究成果: Article › 査読

本文言語	English
ページ（範囲）	119-121
ジャーナル	Proceedings of 1998 International Interconnect Technology Conference
出版ステータス	Published - 1998 6月 1

引用スタイル

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title = "Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer",

author = "K.Ueno K.Ueno and A.Sekiguchi A.Sekiguchi and A.Kobayashi A.Kobayashi and Kazuyoshi Ueno",

year = "1998",

month = jun,

day = "1",

language = "English",

pages = "119--121",

journal = "Proceedings of 1998 International Interconnect Technology Conference",

}

TY - JOUR

T1 - Uniform (111) textured Cu CVD on vacuum annealed Cu seed layer

AU - K.Ueno, K.Ueno

AU - A.Sekiguchi, A.Sekiguchi

AU - A.Kobayashi, A.Kobayashi

AU - Ueno, Kazuyoshi

PY - 1998/6/1

Y1 - 1998/6/1

M3 - Article

SP - 119

EP - 121

JO - Proceedings of 1998 International Interconnect Technology Conference

JF - Proceedings of 1998 International Interconnect Technology Conference

ER -