Utilizing a photosensitive dry film resist in proton beam writing

Hironori Seki, Keiya Kawamura, Hidetaka Hayashi, Yasuyuki Ishii, Nitipon Puttaraksa, Hiroyuki Nishikawa

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Dry film resists (DFRs) are suitable for the fabrication of large volume devices as the thickness of the film can be easily controlled. Here, the DFR microstructures were patterned using the proton beam writing (PBW) technique by taking advantages of the direct-write process, straight trajectories of protons, and large processing depth. The results show that the required irradiation dose of 15 μm DFR was 10 nC mm-2 for 1 MeV protons. In summary, we have optimized the PBW conditions to create smooth surface micropatterns with a vertical wall in the DFR.

本文言語English
論文番号SD1006
ジャーナルJapanese Journal of Applied Physics
61
SD
DOI
出版ステータスPublished - 2022 6月

ASJC Scopus subject areas

  • 工学一般
  • 物理学および天文学一般

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